Demand for the 10-nm lithography equipment ASML increased revenue

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POSTER: computer news   ||    DEMAND FOR THE 10-NM LITHOGRAPHY EQUIPMENT ASML INCREASED REVENUE	DATE:2016-10-20
The Dutch company ASML has reported on the work in the third quarter of 2016.  Compared to the same quarter last year, revenue and net profit of the company increased.  Thus, revenue grew from 1.55 billion euros to 1.82 billion euros, while net profit rose from 322 million euros to 396 million euros.  This growth was the high demand for photolithography equipment for the production of semiconductors with the technological standards of 10 nm.  Demand for such equipment could and developed by companies such as TSMC, Samsung, GlobalFoundries and Intel.  For obvious reasons, customer names are not disclosed.   In the picture above you can see a chart of ASML revenues depending on the category of products sold (only the data for the three quarters ended in 2016).  As the schedule, sales of photolithography equipment for the production of semiconductors contract growing for the second year in a row.  But the equipment for the memory issue has come to enjoy less demand than the last three years. Separately, ASML company  emphasize progress in improving the photolithographic equipment for superhard projections in the range of ultraviolet EUV (13.5 nm).  Performance latest scanner NXE: 3350B with an improved source of radiation reached 1,500 wafers per day for three days of continuous operation.  The previous record - is 500-550 plates per day for a period or 4 week plates 800 for one day. In addition, ASML continues to improve the first version of a commercial scanner EUV - NXE: 3300B.  At the factory setting, the scanner has been achieved within 30 days with 90% efficiency.  Installed at the customer operating items NXE: 3300B demonstrate the effectiveness of just above 80%.  ASML specialists gradually increase the efficiency of previously sold equipment.  Scanners of EUV, recall, may begin commercial operation at the stage of release of 7-nm production, during which they will be used for the manufacture of certain critical layers, and this should happen by early 2018. Related Products :

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