Samsung has completed development of process technology for the production of 10-nm FinFET solutions

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POSTER: computer news   ||   SAMSUNG HAS COMPLETED DEVELOPMENT OF PROCESS TECHNOLOGY FOR THE PRODUCTION OF 10-NM FINFET SOLUTIONS	DATE:2015-07-26
This week, Samsung has officially added the technical process for the production of 10-nm FinFET solutions package to its services.  Specifically, these services are made in the plans for next year.  It is reported that the mass production of 10-nm semiconductor begin in late 2016 with the release of the first commercial production in the first quarter of 2017.  It should be noted, the company TSMC expects to adhere to the same schedule.  Thus, for the first 20- years, Intel's technological production methods involved behind competitors   for 6-9 months. Currently, Samsung is working with reports on the use of 10-nm FinFET process of Multi-Project plates for their major customers (MPW, multi-project wafer).  These plates contain various semiconductors for other purposes, not just one kind of crystal.   Unfortunately, Samsung did not disclose the specifications of semiconductors with a 10-nm process technologies.  We can assume that the 10-nm solutions in comparison with 14 nm significantly increase transistor density, raise the frequency, reduce consumption and will be cheaper in terms of each item. Related Products :

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Xtreview Support N-Post:xxxx Xtreview Support	SAMSUNG HAS COMPLETED DEVELOPMENT OF PROCESS TECHNOLOGY FOR THE PRODUCTION OF 10-NM FINFET SOLUTIONS
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