Like many other companies, the Dutch company ASML also held a meeting with investors. This manufacturer is extremely important for the semiconductor industry. The quality of the tools ASML will depend holy industry - continued compliance with Moore's Law. Individual companies, such as Intel and TSMC, in the case of the production of 10-nm solutions abandon the use of EUV-scanners. But in the future, sooner or later everyone will have to move to new hardware. In ASML anticipate
that by 2020, the company will double and triple the annual revenue, delivering annually 50-60 EUV-scanners.
At the meeting officially confirmed that in 2015, TSMC will receive two EUV-scanner NXE: 3350B. This year, the company received two scanner NXE: 3300B, which will be upgraded to the level of NXE: 3350B. Currently scanners NXE: 3300B equipped with a radiation source power of 80 watts. This allows to process per day 500 300-mm wafers. The increase in power to 125 watts will allow to process about 1,000 plates per day, and 250-watt power will give the opportunity to go on a commercially
viable volumes of 1,500 plates per day, which would mean the ability to handle all four units TSMC to 180,000 wafers per month. It will happen, as expected , in 2016. By that time, TSMC will start trial production of 10-nm semiconductor, although the first stage, apparently, EUV-scanners will be used for the production of 16-nanometer chips.
According to ASML, EUV-scanners will be beneficial for the production of the entire spectrum of semiconductors: logic, DRAM-memory and NAND-flash (to which it relates and resistive memory ReRAM). It would actually be seen. Intel, the for example, even the 7-nm processors plans to produce using old equipment.
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