To set up all kinds of test and measurement equipment needed reference samples . the reference element width of 4 nm. However, for the following technological processes - 11 nm and 7 nm - this is not enough.
ABeam Technologies in cooperation with the Lawrence Berkeley National Lab report that for technical processes less than 11 nm company proposed a structure with a width of 1.5 nm grooves. This is sufficient for calibration of equipment, check the quality of semiconductors with burrows 5-7 nm.
The company did not specify details of how and with what technologies created a new benchmark. . The most important difference from conventional processes for the production of semiconductors is that for the manufacture of lattice materials are used. Related Products :
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