In order to maintain the so-called "Moore's Law" the manufacture of semiconductor manufacturing technology, most manufacturers will sooner or later move to the use of lithography with superhard ultraviolet (EUV). Equipment suppliers in the face of ASML Holding argue that talking about mass use of EUV lithography, it will be possible only within the framework of a 5-nm process technology, which will be mastered not earlier than 2020. However, some customers and shareholders of ASML, in combination, allow the use of EUV lithography, with the release of 7-nm products, and TSMC is one of those "advanced workers".
At the autumn session of the IDF in 2016, which started yesterday, as reported by Bloomberg, Intel management confirmed the absence of the company's plans for the introduction of EUV lithography, not only in the 10-nm process technology, but also within the 7-nm process technology. The processor giant will no hurry with the introduction of EUV-lithography as long as the technology proves its effectiveness. However, Mark Bohr expressed the hope that sooner or later the company is still master the EUV-lithography. Such uncertainty in the statements of Intel representatives caused depreciation of ASML shares by 3.5%. Related Products :
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