In recent years, development of lithography scanners for semiconductor production is inextricably linked with the Dutch company ASML. It not only develops the actual installation, but also the acquisition of the former independent developer of radiation sources - Cymer company (the deal was announced in 2012). The Japanese are reportedly also working on a stand-alone program to create a powerful source of EUV-radiation. In Japan, this company is engaged in Gigaphoton. Company Gigaphoton - is a strong representative in the region. According to her, it has a 50% market share of lithography systems based on excimer ArF-lasers in Taiwan and South Korea.
On assurances of ASML representatives , Gigaphoton radiation sources is not superior in performance to sources Cymer. New ASML scanners, which will be sent to customers later this year, will be equipped with a source 125-watt light. Actual EUV-scanners are sources of radiation power of 80 watts. Gigaphoton company jointly with Mitsubishi Electric announced the development of a capacity of 118 watt carbon dioxide laser. And Cymer and Gigaphoton while in the long term promise to the creation of 250-watts of EUV-source, which is required for the full commercial production with the use of radiation in the ultraviolet range superhard.
In ASML confirmed that Gigaphoton radiation sources structurally compatible with scanners and companies in case of a successful design can be installed in commercial ASML products. More information about Gigaphoton company's achievements will be discussed at the Photonics West conference, Kotra will be held in San Francisco from 28 January to 2 February. Also at the conference, you will learn about the development of the hybrid image sensors Imec center and the company M-Squared Lasers Ltd (two separate development), laser of 3D-printers, scanning the brain and the universe.