Yesterday was the regular event SPIE (Society of Photo-Optical Instrumentation Engineers , SPIE). One of the issues discussed at the meeting was the issue of commercial maturity lithography superhard ultraviolet (EUV). His opinion on this expressed Intel and Samsung. Separately, were representatives of the Belgian center Imec, which submitted EUV lithography as an auxiliary for the production of 5-nm semiconductors.
Previously, almost all agree that, for the purposes of commercial EUV-projection will start to be used in 2020, the district, but only for the production of several critical layers. This will instead of four projections on the layer for 193 nm immersion lithography is limited to a projection on the layer of 13.5 nm of EUV-lithography.
In October last year, representatives of the Samsung More companies said they will use of EUV-scanners for the production of 7-nm chips. True the company did not specify how and when it will happen. Intel company also emphasize the critical importance of EUV-scanners for the production of 7-nm solutions but to start such production before commercial maturity of EUV-scanners is unreasonable.
One of the points in the design - is to create a protective film to prevent the occurrence of defects on the plates under the influence of hard radiation. But the most important point - the creation of instruments for detecting defects on a photomask . Intel and Samsung are developing their own tools, instead of relying on the company profile . T
Samsung company manages to create a photomask to EUV-projection with high quality, the number of defects is less than five. Intel, in turn, reported the presence of its own lines for the production of EUV photomasks to-projection and it has already been tested for the production of defect-free masks for the production of 14-nm, 10-nm and 7-nm designs. Related Products :
|