ASML confirms 18 orders for the EUV-equipment for the production of semiconductors

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POSTER: computer news   ||   ASML CONFIRMS 18 ORDERS FOR THE EUV-EQUIPMENT FOR THE PRODUCTION OF SEMICONDUCTORS	DATE:2013-04-19
ASML Holding NV company, one of the world's largest manufacturers of lithography equipment for the production of semiconductors, spoke about the results of the first quarter this year.  In general, ASML is fine.  In line with seasonal trends, the company's revenue for the quarter decreased from 1.023 billion euros to 892 million, while net profit fell from 298 million euros to 96 million, the company's confidence in their abilities reports that it began the process of redemption shares in the amount of one billion euros. We are interested in ASML company , for the reason that it is an indicator of the development of new production methods.  In the short term - is to move to production with the norms of 14-20 nm, a little more distant - is the development of lithography in superrigidity ultraviolet (EUV).  In the past year to develop EUV-based equipment Intel, Samsung and TSMC invested in ASML.  Moreover, all three producers have bought stock. Now tools manufacturer is preparing to supply the first two EUV-series scanner NXE: 3300B.  One will be sent to customers in the second quarter, the second - in the third.  Previously, ASML announced the receipt of orders for EUV-11 scanners.  In the first quarter was added another 7 applications.  At the moment, as in the next two years, this equipment is being piloted.  EUV-power emitters managed to increase from last year's 40 watts to 55 watts.  This allows us to achieve output 40 plates per hour.  For commercial production this is a little.  It is estimated that the economic impact of the transition to EUV-lithography will be achieved if the scanners can handle at least 100 wafers per hour.  In  promise to cope with this task until 2015.  Literally: in 2015 ASML expects the first commercial semiconductors, released by EUV-scanners. In terms of specific technological production standards  , the company confirmed the ability to handle scanner NXE: 3300B masks scale 13 nm in a single pass.  Using two runs and two photomask managed to get 9-nm semiconductors, which opens the way to the production with the standards below 10 nm.  The company also said that with the help of its partners, sponsors (club 450G, which includes all of the above companies, as well as  GlobalFoundries company), completed the development of architecture in the rough for the production of equipment with an eye to the processing of 450-mm wafers.  The first prototypes of tools to work with 450-mm plates using immersion lithography will be created by 2015.  Serial production of the relevant equipment will begin in 2018. If we talk about the immediate prospects,  ASML noted the high interest in scanners to produce 20-nm and 14-nm-making.   Related Products :

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