Intel confirmed the rejection of EUV-equipment in the production of 10-nm semiconductor

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POSTER: computer news   ||   INTEL CONFIRMED THE REJECTION OF EUV-EQUIPMENT IN THE PRODUCTION OF 10-NM SEMICONDUCTOR	DATE:2014-09-07
In the production of 10-nm semiconductor Intel company will not use the lithographic equipment, based on a projection using 13-nm hard ultraviolet radiation.  Intel will continue to use 197-nm scanners,  using as many as four or five photomask .  For obvious reasons, this will significantly lengthen the production cycle.  However, at Intel believe that the increase in the cost of production of the new chips will not be as good as if we had to install a completely new factory equipment. It should be noted that it is not only the absence of EUV-scanners.  Theoretically, ASML and Nikon company  will release the 2016 serial EUV-scanners.  Replace some other scanners in the clean room will be relatively simple.  It is possible that EUV-scanners even fit on the place of the old.  The main problem would be to replace equipment for the maintenance of new scanners and support their performance.   In fact, Intel has admitted that the new equipment was late by a few years.  The release of 10-nm is going to start in 2016.  By this time, they can not create a new factory infrastructure.  So we have to use what is already there. Related Products :

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Xtreview Support N-Post:xxxx Xtreview Support	INTEL CONFIRMED THE REJECTION OF EUV-EQUIPMENT IN THE PRODUCTION OF 10-NM SEMICONDUCTOR
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