EUV-lithography may return to Moores Law

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POSTER: computer news   ||   EUV-LITHOGRAPHY MAY RETURN TO MOORES LAW	DATE:2016-11-30
Stacy Smith recently replaced the chair of the financial Intel director  for the post of executive vice president of production and sales, and in an interview with the leading events Credit Suisse he touched the specifics of the so-called "Moore's Law", which slows its action, forcing the developer processor longer to adhere to a single stage lithography process technology.  In particular, as explained Smith, under the 14-nm process technology provides at least three generations of products.  He argues that such an increase of the life cycle of process technology allows Intel customers to build forecasts and clear plans for the future. The development of 14-nm process technology from Intel require more time than originally planned.  However, the company was able to increase the density of transistors more than expected.  Moreover, as noted by the former financial director of the Intel, in value terms, "Moore's law" continues to work with the same increments.  At least with regard to Intel production possibilities .  So far, the company manages to get a better unit cost than by reference to the part of the perpetrator.  Intel still believes that is ahead of competitors in a generation process technology, at least. Sticking to "Moore's curve" Intel expects even in those circumstances where the competitors will be able to do this.  The introduction of lithography with superhard ultraviolet (EUV), elements of which Intel has plans to use as part of a 7-nm technology could restore "Moore's Law" on track when the transistor density doubles every two years.  However, this may not happen, according to Stacy Smith. Related Products :

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