TSMC will implement EUV lithography is only the second year of life, 7-nm process technology

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POSTER: computer news   ||   TSMC WILL IMPLEMENT EUV LITHOGRAPHY IS ONLY THE SECOND YEAR OF LIFE, 7-NM PROCESS TECHNOLOGY	DATE:2017-01-13
Until now, TSMC company  with a fair degree of certainty say about its ability to implement lithography with superhard ultraviolet (EUV) in the production of 5 nm or even 7-nm products, but recently in the voice of its representatives have begun to sound notes of doubt .   At yesterday's conference, the reporting of quarterly TSMC guide explained how elements of EUV-lithography will be used as part of a 7-nm technology.  The latter, incidentally, will be certified by the end of the current quarter, and customers will be involved in the relevant work already in the second quarter.  The development of 7-nm products are already 20 to 25 TSMC customers.  After a couple of years, TSMC is going to go on a 5-nm process technology, which will bring already-massive use of EUV lithography. If we go back to the earlier version of the 7-nm process technology, it will do without experiments of EUV-lithography.  Only in the second year of 7-nm TSMC promises to start the life cycle of the application of superhard lithography with ultraviolet radiation.  The end customers, such a transition will reduce production costs and increase the transistor density.  Moreover, the phased introduction of EUV will enable less risk to introduce this technology in the framework of a 5-nm rules. Related Products :

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