|
As reports associate, Massachusetts Institute scientists was able to prolong the life cycle of utilized from the middle of ninetieth years lithographic technology. The application of lithograph interference allowed developers to create elements with linear dimension, which corresponds to the 25 nm technology. In order to use this method scientists must solve some problems with the utilized materials. With its aid, for example, it is not possible to create microcircuit with different blocks form. But for the production of memory microcircuits , solar battery cells and some other devices this method is completely suitable. According to IBM and Intel estimations, passage to the EUV- technology are planed in 2013, when microcircuits will be let on the 16 nm standards.
Related Products :
|
EUV WITH 25 NM TECHNOLOGY
|