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According to Kurt ronse, director of lithograph in IMEC program, the most probable technology for the adoption of 22 nm standards (and less) is the lithograph in rigid ultraviolet range (EUV).
The capacity of corresponding equipment prototype is approximately equal to 2,5 plates per hour in order to approach the indices of optical lithograph equipment , they must increase this value to 100 plates per hour.
Rons said that none of two methods, examined for expanding the possibilities of immersion lithograph give a satisfactory results. In particular, the method, built on a increase in the immersion medium refractive index did not succeed.
The pre-series models EUVL- equipment is expected to appear in the beginning of 2010. Related Products :
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