TSMC intends to use EUV-lithography within 5 nm process

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POSTER: computer news   ||   TSMC INTENDS TO USE EUV-LITHOGRAPHY WITHIN 5 NM PROCESS	DATE:2015-07-18
According to market participants services for the production of semiconductor devices on the timing of the introduction of so-called lithography with superhard ultraviolet (EUV) is currently divided.  Intel is still doubt whether the required EUV-lithography for the production of 7-nm production , while IBM and its technology partners are almost sure that the transition to EUV-lithography is necessary in the framework of the 7-nm process technology.   The two leaders, one holding the position of CEO at the same time, talked about it on the quarterly reporting the conference for a long time.  But first I would like to discuss advances in the development of TSMC 10-nm process technology - the company assured that everything goes according to plan and there are no problems.  Samples of 10-nm products by TSMC will be offered to customers at the turn of this and next year,  mass production will be deployed at the end of 2016.  Recall that Intel its 10-nm processors Cannon Lake will start massively to deliver only in 2017, mainly in the second half of the period. In the course of clarifying the circumstances in a conversation with the analyst one of the Directors General of TSMC admitted that the real products at 10-nm technology will be launched no earlier than the first quarter  2017.  And since Intel in the second half of the year promises to produce 10-nm processors millions of pieces, it can be assumed that the first batch will be also in the first half of 2017. TSMC can already speak about the developments in the 10-nm technology.  For example, the switching speed of the transistors, compared with a 16-nm process technology was increased by 15% at constant energy consumption, and energy consumption at a constant speed can be reduced by 35%.  The density of transistors managed to increase by 2.2 times compared to the 16-nm process technology. TSMC says that the first customers in the framework of the 10-nm process technology will become the developers of mobile processors, telecommunications solutions and high-performance products for some calculations.  Work on the introduction of 7-nm process technology, too, is in full swing - customers will be able to place orders in the first quarter of 2017, in just five quarters after the first purchase of a 10-nm solutions.  Over the 7-nm technology, a team of specialists working in parallel, which explains why such a small gap in terms of implementation.  It is expected that the transition from 10 nm to 7 nm to be optimized from the viewpoint of reuse some parts of instruments and equipment. The question of slowing down the principle of Moore's Law guide TSMC discussed philosophically.  According to one of the heads of the company, there will be three year a gap in the implementation of TSMC from 16-nm to 10-nm technology , and to 7-nm technology transition will be done for about a year.  Two and a half years, which says Intel - quite an adequate period for doubling transistor density, according to TSMC. As part of the 7-nm TSMC technology is not yet ready to use EUV-lithography on an industrial scale, but the experiments will be conducted on this combination.   Related Products :

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