Texas Instrument could not change the order of new production methods introduction

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POSTER: computer news   ||   TEXAS INSTRUMENT COULD NOT CHANGE THE ORDER OF NEW PRODUCTION METHODS INTRODUCTION	DATE:2012-12-19
Replaced by modern manufacturing projection equipment based on 193-nm laser could reach 157-nm projection as recognized technologist Texas Instrument, Jim Blatchford .  At the time, the company has negotiated with manufacturers of tools, during which there has been some consensus.  When it came time to discuss the standards, an industry group of developers - SPIE, Society of Photo-Optical Instrumentation Engineers - opted for immersion (immersion) lithography.   The possibility to increase the resolution of  microscope by placing the fluid between the lens and the subject was proved in the seventeenth century by English naturalist Robert Hooke .  Three hundred years later, these microscopes have emerged as a daily working tool in all scientific laboratories.  Thus, the resolution of the projection is increased by a significant amount without reducing the wavelength of the laser projection. First immersion lithography in 2005, is widely used by TSMC company , applying it to the production of 65-nm semiconductor.  AMD has moved to immersion projection method applied to 45-nm solutions, and Intel company  - the implementation phase of 32-nm semiconductor.  At the same time to reduce the size of an element on the chip was used as a turn-based projection with two and even three photomasks. To date, TI plans to move to less risky 157-nm projection , and in fact it could have been different ...  Limit of 193-nm immersion lithography some call 8-nm process technology, others - 5-nm and even 3 nm.  But its ability to take out, as they say, to the bottom - it can cost a pretty serious money. This year well invested  Intel, Samsung and TSMC company.  This gives a certain chance that in two or three years of commercial EUV-projection can speak more confidently.  While skeptics have criticized both the expected life time of the 193 nm immersion lithography, and the earliest possible commissioning of EUV-lithography.   Related Products :

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