During the week, IBM and ASML reported a breakthrough in the development of lithography in the deep ultraviolet range (EUV). This opens the way to semiconductors with the norms of less than 10 nm. Judging by the lack of comments on this news on the forum, it's all nonsense and not worth discussing. Meanwhile, IBM announced the test, during which staff ASML scanner with a source of power 44 W passed through himself 637 per night semiconductor wafers or 34 plates per hour. The previous record EUV-IBM equipment in the factory was 7 plates per day, and declared what the latest modifications scanners ASML - 145 plates per day. IBM also reported that could potentially pass through the scanner ASML NXE3300B experienced about 800 plates per day. In fact, this recognition EUV-ready equipment for deployment.
According to the president of Semiconductor Advisors LLC, Mayor Robert (Robert Maire), IBM and ASML intends to enter the public misleading and falsified test results . After this message ASML shares rose by 14%. IBM also declared quantity of plates did not recreate the real production cycle with application to the photoresist plate. IBM has just launched a circle one-two-three plates, checking, in fact, the capacity of the transport system of the scanner, and not the entire system in the complex. Simply put, committed fraud. Both companies are in desperate need of good news - says Mayor..
IBM's representative did not agree with the assessment of the experiment by the opponent. It is argued that the main objective of the test was not running a particular process technology with complete production cycle but to check the scanner's ability to withstand ASML certain workloads during the day. With this equipment right to the top five. Additionally, IBM made it clear that in the process of photomask used one that focuses on 22-nm process.