ASML for the production of 7-nm semiconductor advantageous to use EUV-scanners

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POSTER: computer news   ||    ASML FOR THE PRODUCTION OF 7-NM SEMICONDUCTOR ADVANTAGEOUS TO USE EUV-SCANNERS	DATE:2014-09-18
According to Intel, to use existing equipment and a 197-nm scanners can not only for the production of 10-nm chips, but also 7 nm.  If we apply the well-known strategy of tick-tock , the launch of the 5-nm process is expected in 2020.  For Intel, this may be indicative year of commissioning of the EUV-scanners.  From this you can also make a cautious conclusion that serial EUV-equipment company must apply no later than 2019.   Part of ASML will manufacture prototype EUV-equipment.  However, without the start of mass production of a new generation of instruments made in the general case will be difficult.   The president and chief technology officer of ASML, Martin van den Brink expressed doubts about the feasibility of producing in the future 7-nm solutions on older hardware.  This is all the more interesting that Intel is the largest sponsor in ASML to develop EUV-equipment.  Perhaps more scanner manufacturer intends to rely on the support of companies TSMC and Samsung. As calculated in the ASML, for the projection of the individual layers in the case of a 7-nm production for the 197-nm scanners will need up to 13 masks.  For the release of 10-nm-making will need no more than 5 masks.  In the case of 10 nm, thereby manufacturing process becomes longer in the not too critical time interval, whereas for the manufacture of 7-cost manufacturing solutions nm on conventional equipment will rapidly increase.  Price for EUV scanner is expected to be $ 100-120 million. PRICE 197-nm scanner is now $ 70 million. Difference is significant, but in the case of mass production, it can be for two years leveled to the level of profitability.  In fact, although ASML suggests a possible modular equipment upgrades, the price for the conversion of the factory can reach space dimensions.  According to experts, for example, the cost of the plant using EUV-equipment may reach $ 10 billion. The price for a modern factory with 197-nm scanners at $ 3-4 billion. Qualification tests of EUV-scanners  customers ASML company  expects to spend in 2016.  However, part of the processes do not depend on it.  For example, although ASML themselves develop protective coatings for EUV-photomask and indestructible hard radiation from the photoresist profile manufacturers have to take care of the defect-free photomasks and persistent photoresists.  Ideally, ASML expects to receive photomasks without a protective coating which, somehow, makes its own distortions in image projection. Pre-production scanner for EUV-projection will be machine ASML 3350B.  The design capacity of this equipment - 1000 plates per day, but at the first stage it will not exceed 800 plates per day.  ASML has now sources of radiation with a power of 77 watts.  By the end of year , the capacity will be increased to 80 W, which is twice more than in the case of the first test EUV-equipment, which began to be delivered a year or two ago.  Progress has been made, and the productivity of 1000 plates per day - this is the barrier, after the capture of which we can talk about the commercial release of semiconductors using EUV-scanners.   Related Products :

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